Advanced process control for photolithography.
نویسندگان
چکیده
منابع مشابه
Adaptive Modeling and H∞ Control for Photolithography Manufacturing Process
A run-by-run feedback controller is designed for Intel manufacturing fabs to stabilize the critical dimension in the process of photolithography, in the presence of unpredictable process drift and unknown non-Gaussian disturbances. The controller is a combination of an adaptive model with an H∞ feedback.
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1995
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.8.689